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MICRO PIX® - Batch Wafer Clean/Dry
Megasonic Cleaning & IPA Dry
50 to 300 mm Wafers & Substrates
Priced Under USD 98K*

Features/Benefits

  • Up to 120nm Particle Neutral Dry

  • Eco-Friendly Passive IPA Dry

  • Always Clean IPA Filtration & Dispense

  • High Particle Removal Efficiency >97%

  • No Damage to Device Structure

  • Single or Dual Tank Designs

Passive IPA Aerosol DryTM

Proprietary process passively creates an ultra-clean, super-efficient (1-6ml per cycle) IPA aerosol.

Pixelated Megasonics®

Proprietary process creates precisely tailored energy distribution for more effective cleaning at low power



*Base Model Price varies with size, application, options, etc.



Contact us at:
sales@chemacoustic.com